Yellow tungsten oxide target is formed by using WO3 as a coating target and magnetron sputtering, by multiple arc ion plating or other types of coating system to form WO3 functional film on the substrate by sputtering under appropriate process conditions. WO3 thin film is an important functional material, has excellent electrochromic properties, and is widely used. The common preparation methods of yellow tungsten oxide target are solid phase method, liquid phase method and vapor phase method. Preparation process is as follows: ball milling-pressing -sintering.
Yellow tungsten oxide target SEM analysis shows that under different temperature, calcinated YTO sample has differences between density, crystalline binding strength. Below SEM is yellow tungsten oxide target sintered under different temperature.